Characterization of oxide layers induced by oxygen ion implantation into Ti, V, Cr, Zr, Nb, Mo, Hf, Ta and W
- 31 August 1994
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 66 (1-3) , 384-388
- https://doi.org/10.1016/0257-8972(94)90035-3
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Effects of room temperature carbon, nitrogen and oxygen implantation on the surface hardening and corrosion protection of ironSurface and Coatings Technology, 1992
- Energy deposition effects of additional ion bombardment on titanium oxides formed by oxygen implantationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991
- Target temperature dependence on titanium oxide formation by high-dose oxygen ion implantation into titanium sheetsMaterials Science and Engineering: A, 1989
- Formation of rutile TiO2 induced by high-dose O+ -implantation and its characteristicsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
- Titanium overlayers on TiO2(110)Surface Science, 1987
- Channeling Studies of Ion-Implantation Damage in Titanium DioxideMRS Proceedings, 1987
- Surface defects of TiO2(110): A combined XPS, XAES AND ELS studySurface Science, 1984
- On the problem of whether mass or chemical bonding is more important to bombardment-induced compositional changes in alloys and oxidesSurface Science, 1980