Electrical Properties of Platinum-Silicon Contact Annealed in an H₂Ambient

• 1 June 1978
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 17  (6) , 1089-1098
• https://doi.org/10.1143/jjap.17.1089

Abstract

Keywords

• SCHOTTKY BARRIER
• ARSENIC
• HEAT TREATMENT
• AUGER ELECTRON SPECTROSCOPY
• OHMIC CONTACT