Wavelength dependence of exposure window and resist profile in x-ray lithography

• 1 November 1994
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 12  (6) , 4044-4050
• https://doi.org/10.1116/1.587427

Abstract

Keywords

• RESIST
• WAVELENGTH DEPENDENCE
• RAY LITHOGRAPHY
• EXPOSURE WINDOW
• DEPENDENCE OF EXPOSURE