Ferroelectric Films Deposited by Reactive Sputtering and Their Properties
- 1 January 1983
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 22 (S2)
- https://doi.org/10.7567/jjaps.22s2.18
Abstract
Thin films of ferroelectric materials (PZT and PLZT) have been deposited by dc reactive co-sputtering from composite metal target. Although the structure of the resulting films without substrate heating was proved as amorphous through X-ray diffraction, it can be changed to provide a desired perovskite structure by subsequent heat-treatment in a lead-compensated atomosphere. Some of the films, after poling in the planar direction, showed an obvious piezoelectric activity.Keywords
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