Piezoresistance in polycrystalline germanium films
- 1 September 1969
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 4 (3) , 211-217
- https://doi.org/10.1016/0040-6090(69)90037-6
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Stress in Evaporated Bismuth Films during and after DepositionJapanese Journal of Applied Physics, 1968
- Structural model for amorphous germanium layersThin Solid Films, 1968
- Elastoresistance Effects in Evaporated-Antimony FilmsJapanese Journal of Applied Physics, 1967
- Mobilite des porteurs et resistivite des couches minces polycristallines de germanium evapore sous videJournal of Physics and Chemistry of Solids, 1966
- Strain Gauge Calibration Device for Extreme TemperaturesReview of Scientific Instruments, 1959
- Temperature Dependence of the Piezoresistance of High-Purity Silicon and GermaniumPhysical Review B, 1957
- Piezoresistance Effect in Germanium and SiliconPhysical Review B, 1954