Surface Reaction Rate during ZrO2 Thin Film Formation by MOCVD. Step coverage on micro-trenches.
- 1 January 1992
- journal article
- Published by Society of Chemical Engineers, Japan in KAGAKU KOGAKU RONBUNSHU
- Vol. 18 (2) , 212-218
- https://doi.org/10.1252/kakoronbunshu.18.212
Abstract
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