The metastable C49 structure in sputtered TiSi2 thin films
- 1 April 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 158 (2) , 255-263
- https://doi.org/10.1016/0040-6090(88)90028-4
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Nucleation and growth of titanium silicide studied by i n s i t u annealing in a transmission electron microscopeJournal of Applied Physics, 1987
- Metastable phase formation in titanium-silicon thin filmsJournal of Applied Physics, 1985
- Small Angle Electron Scattering from Vacuum Condensed Metallic Films I. TheoryPhysica Status Solidi (b), 1967