Secondary Electron Emission from a Hydrogen-Implanted Graphite by Low-Energy Electron Impact
- 1 May 1991
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 30 (5R) , 1093
- https://doi.org/10.1143/jjap.30.1093
Abstract
For a plasma-surface interaction, the influence of an implantation of hydrogen atoms on the secondary electron emission of graphite bombarded by low-energy (<500 eV) electrons is investigated by using a Monte Carlo simulation. The results show that the secondary electron yield increases and the backscattering yield decreases; the incident-angle dependence of the former is little enhanced and the dependence of the latter is largely enhanced.Keywords
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