Secondary Electron Emission from a Hydrogen-Implanted Graphite by Low-Energy Electron Impact

Abstract
For a plasma-surface interaction, the influence of an implantation of hydrogen atoms on the secondary electron emission of graphite bombarded by low-energy (<500 eV) electrons is investigated by using a Monte Carlo simulation. The results show that the secondary electron yield increases and the backscattering yield decreases; the incident-angle dependence of the former is little enhanced and the dependence of the latter is largely enhanced.