Structure and Reactivity of Silicon Clusters in the Gas Phase
- 1 February 1992
- journal article
- highlight
- Published by Wiley in Angewandte Chemie International Edition in English
- Vol. 31 (2) , 172-173
- https://doi.org/10.1002/anie.199201721
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Nanosurface Chemistry on Size-Selected Silicon ClustersScience, 1991
- Reactions of silicon cluster ions, Si+n (n=10–65), with waterThe Journal of Chemical Physics, 1991
- Ammonia chemisorption studies on silicon cluster ionsThe Journal of Chemical Physics, 1991
- Laser annealing of silicon clustersThe Journal of Chemical Physics, 1990
- Theoretical studies on silicon clustersPhase Transitions, 1990
- Chemistry of semiconductor clusters: Large silicon clusters are much less reactive towards oxygen than the bulkThe Journal of Chemical Physics, 1990
- Chemistry of semiconductor clusters: reactions of Sin+ (n = 11-50) with ethylene show evidence for numerous structural isomersJournal of the American Chemical Society, 1990
- Preparation and observation ofclusters on a Au(001)-(5×20) surfacePhysical Review B, 1989
- Chemistry of semiconductor clusters: A study of the reactions of size selected Si+n (n=3–24) with C2H4 using selected ion drift tube techniquesThe Journal of Chemical Physics, 1989
- Reactive etching of positive and negative silicon cluster ions by nitrogen dioxideThe Journal of Chemical Physics, 1987