Ion-Bombardment Etching of Synthetic Fibers. II

Abstract
Ion-bombardment etching of synthetic polymers is shown to result in an actual preferential removal of material in a manner similar to that producing the etch on natural polymers and on inorganic materials and metals. It is also shown that heat has little effect on the over-all etch pattern produced. In addition evidence is given relating the structures revealed by ion-bombardment etching and the low-angle x-ray periods which have been reported in the literature for polyethylene.

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