New high resolution and high sensitivity deep UV, x-ray, and electron beam resists
- 30 April 1990
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 11 (1-4) , 487-489
- https://doi.org/10.1016/0167-9317(90)90156-n
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Photoinitiated cationic polymerization by dialkylphenacylsulfonium saltsJournal of Polymer Science: Polymer Chemistry Edition, 1979