Suppression of Stacking Fault Generation in Silicon Wafer by HCl Added to Dry O₂Oxidation

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1 January 1976

journal article
Published by IOP Publishing in Japanese Journal of Applied Physics

Vol. 15 (1) , 83-86
https://doi.org/10.1143/jjap.15.83

Abstract

No abstract available

Cited by 19 articles