20 nm linewidth platinum pattern fabrication using conformal effusive-source molecular precursor deposition and sidewall lithography
- 1 September 1992
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 10 (5) , 2251-2258
- https://doi.org/10.1116/1.586197
Abstract
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