Microstructure of Si3N4-TiN composites prepared by chemical-vapour deposition
- 1 November 1982
- journal article
- Published by Springer Nature in Journal of Materials Science
- Vol. 17 (11) , 3336-3340
- https://doi.org/10.1007/bf01203503
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Preparation and some properties of chemically vapour-deposited Si3N4-TiN compositeJournal of Materials Science, 1982
- Synthesis of β‐Si3N4 by Chemical Vapor DepositionJournal of the American Ceramic Society, 1981
- Selective Studies of Chemical Vapor‐Deposited Aluminum Nitride‐Silicon Nitride Mixture FilmsJournal of the Electrochemical Society, 1978
- Chemical vapor deposition in the systems silicon-carbon and silicon-carbon-nitrogenJournal of the Less Common Metals, 1974
- Gasphasenabscheidung im system TiSiCJournal of the Less Common Metals, 1972
- Morphologie des gasphasenabgeschiedenen systems titancarbid-graphitJournal of the Less Common Metals, 1971