Early stages in thin film metal–silicon and metal–SiO2 reactions under rapid thermal annealing conditions: The rapid thermal annealing/transmission electron microscopy technique
- 1 November 1986
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 4 (6) , 1404-1408
- https://doi.org/10.1116/1.583465