Reticles By Automatic Pattern Generation

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Abstract
The automatic production of reticles for semiconductor masks has become a well-established production technique using optical pattern generators. The important characteristics of these generators are defined and a comparison made of the types in general use today. The advantages and disadvantages of the optical and electron beam generators as related to reticle-making are defined and discussed. In a general overview of mask requirements, the characteristics of masks currently in use are related to the trends of the future.

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