Electron Shielding in Heavily Doped Semiconductors
- 15 February 1969
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 178 (3) , 1337-1339
- https://doi.org/10.1103/physrev.178.1337
Abstract
The ionization energy of an electron bound to a donor atom is calculated as a function of the number of electrons in the conduction band and the temperature assuming Thomas-Fermi screening. The results are compared with a previous numerical calculation performed for InSb. We also show that it is possible to induce a Mott transition by applying stress to a degenerately doped many-valley semiconductor, with a resulting change from a metallic to an insulating phase.Keywords
This publication has 8 references indexed in Scilit:
- Singly-Ionized-Impurity Scattering in Degenerate MaterialPhysical Review B, 1968
- Electron Shielding in-InSbPhysical Review B, 1967
- The transition to the metallic statePhilosophical Magazine, 1961
- Theory of Transport Effects in Semiconductors: ThermoelectricityPhysical Review B, 1956
- Impurity Scattering in SemiconductorsProceedings of the Physical Society. Section B, 1956
- Motion of Electrons and Holes in Perturbed Periodic FieldsPhysical Review B, 1955
- XIV. The distribution of electrons round impurities in monovalent metalsJournal of Computers in Education, 1952
- Electrical Properties of Pure Silicon and Silicon Alloys Containing Boron and PhosphorusPhysical Review B, 1949