Compact electron cyclotron resonance plasma source for molecular beam epitaxy applications

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Abstract
We describe a compact, versatile electron cyclotron resonance (ECR) nitrogen plasma source specially designed to be mounted on a 35 conflat flange. The operation frequency is 2.45 GHz. The magnetic field is produced by permanent magnets. In order to eliminate ions in the plasma stream, a nonaxial geometry of the magnetic field was chosen. Two applications are discussed, namely, the p-type doping of II–VI tellurides and the growth of III–V nitrides. In both cases, use of the ECR plasma source results in high quality material.

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