Annealing and thickness effects on the electrical resistance of vacuum-deposited tin antimonide alloy films
- 1 December 1974
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 24 (2) , 203-210
- https://doi.org/10.1016/0040-6090(74)90165-5
Abstract
No abstract availableKeywords
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