High-resolution shadow-mask patterning in deep holes and its application to an electrical wafer feed-through
- 30 June 1996
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 54 (1-3) , 669-673
- https://doi.org/10.1016/s0924-4247(97)80035-0
Abstract
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