High-precision automatic ellipsometer and whereby evaluation of a very thin silicon-oxide layer
- 1 January 1984
- journal article
- research article
- Published by Wiley in Electronics and Communications in Japan (Part I: Communications)
- Vol. 67 (12) , 96-105
- https://doi.org/10.1002/ecja.4400671212
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Measurement of the thickness and refractive index of very thin films and the optical properties of surfaces by ellipsometryJournal of Research of the National Bureau of Standards Section A: Physics and Chemistry, 1963