Messung des übergangswiderstandes zwischen metall und diffusionsschicht in Si-planarelementen
- 30 November 1969
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 12 (11) , 879-886
- https://doi.org/10.1016/0038-1101(69)90045-8
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- A Two-Dimensional Mathematical Analysis of the Diffused Semiconductor ResistorIBM Journal of Research and Development, 1968
- Electrical contacts to siliconSolid-State Electronics, 1965