Formation of high temperature phases in sputter deposited Ti-based films below 100 °C

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Abstract
This article reports on the sputtering of pure Ti and Ti-based alloy films onto substrates where the temperature Ts was kept below 100 °C, using the magnetron sputter ion plating process. It was found that while the pure Ti film is a hexagonal low-temperature phase film (h–αTi), the Ti–Cr, and Ti–Fe alloy films, containing a relatively small amount of Cr or Fe of about 10 wt %, are cubic high-temperature beta phase Ti alloy films [c-βTi(Cr) or c-βTi(Fe)]. This finding is of immense importance both scientifically and practically. The conditions under which high-temperature phases are formed in alloy films sputtered at substrate temperatures below 100 °C, which is much lower than the temperature necessary to form these high-temperature phases (Thtp) according to the equilibrium phase diagram, will be discussed in detail. X-ray diffraction analyses of these films will also be presented.

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