1.55 μm DFB laser array with λ/4-shifted first-order gratings fabricated by X-ray lithography

19 January 1989

journal article
Published by Institution of Engineering and Technology (IET) in Electronics Letters

Vol. 25 (2) , 148-149
https://doi.org/10.1049/el:19890107

Abstract

First-order grating patterns (λ = 0.24 μm) with λ/4-shift for DFB laser array were successfully fabricated by X-ray lithography. The 20-DFB laser array operated in the single longitudinal mode and the wavelength varied as designed.

Keywords

FIRST-ORDER GRATINGS
QUARTER-WAVE SHIFTED GRATINGS
X-RAY LITHOGRAPHY
DFB LASER ARRAY
240 NM
SINGLE LONGITUDINAL MODE
GAINASP-INP LASERS
SEMICONDUCTORS
1.55 MICRON