Novel photoacid generators: Key components for the progress of chemically amplified photoresist systems.
- 1 January 1991
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 4 (3) , 389-402
- https://doi.org/10.2494/photopolymer.4.389
Abstract
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