Drastic reduction of series resistance in doped semiconductor distributed Bragg reflectors for surface-emitting lasers
- 18 June 1990
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 56 (25) , 2496-2498
- https://doi.org/10.1063/1.102869
Abstract
Modifications to reduce the series resistance in p‐type semiconductor distributed Bragg reflectors (DBR) consisting of ten pairs of quarter‐wavelength GaAs (high refractive index)/Al0.7Ga0.3As (low index) layers were made by inserting an intermediate Al0.35Ga0.65As layer or a 200 Å superlattice of GaAs(10 Å)/Al0.7Ga0.3As (10 Å) at the GaAs/Al0.7Ga0.3As heterointerfaces. The specific DBR series resistance was reduced by two orders of magnitude to about 6.2×10−5 Ω cm2. These modifications did not alter the optical reflectivity and nearly identical reflection spectra were measured.Keywords
This publication has 7 references indexed in Scilit:
- Room-temperature continuous-wave vertical-cavity surface-emitting GaAs injection lasersApplied Physics Letters, 1989
- Room-temperature continuous-wave vertical-cavity single-quantum-well microlaser diodesElectronics Letters, 1989
- Room-temperature continuous wave lasing characteristics of a GaAs vertical cavity surface-emitting laserApplied Physics Letters, 1989
- Buried Heterostructure GaAs/GaAlAs Distributed Bragg Reflector Surface Emitting Laser with Very Low Threshold (5.2 mA) under Room Temperature CW ConditionsJapanese Journal of Applied Physics, 1989
- Chemical beam epitaxially grown InP/InGaAsP interference mirror for use near 1.55 μm wavelengthApplied Physics Letters, 1987
- High-reflectivity GaAs-AlGaAs mirrors: Sensitivity analysis with respect to epitaxial growth parametersJournal of Applied Physics, 1987
- Coupled-Wave Theory of Distributed Feedback LasersJournal of Applied Physics, 1972