Temperature Dependence of Nucleation Density of Chemical Vapor Deposition Diamond
- 1 February 1992
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 31 (2B) , L193
- https://doi.org/10.1143/jjap.31.l193
Abstract
The temperature dependence of the nucleation density of Chemical Vapor Deposition diamond was carefully investigated by ellipsometric monitoring. Substrates were pre-treated by rubbing with diamond powder and then by wiping off the residual powder until visually clean. Nucleation density was greater than 1010/cm2 in some ranges of temperature. It was also observed that nucleation density increased suddenly to 860°C and then gradually decreased in the range of higher temperatures. The results were explained by a change in the adsorption state of the precursor, from a physical to a chemical.Keywords
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