Plasma x-ray source for lithography generated by a ≊30 J, 30 ns KrF laser
- 24 October 1988
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 53 (17) , 1583-1585
- https://doi.org/10.1063/1.99919
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Subnanosecond pulses from a KrF laser pumped SF6Brillouin amplifierIEEE Journal of Quantum Electronics, 1985
- Phase conjugation of KrF laser radiationOptics Letters, 1981
- Efficient narrowband electron beam pumped KrF laser for pulse-compression studiesJournal of Applied Physics, 1981
- X-ray yields of plasmas heated by 8-nsec neodymium laser pulsesJournal of Applied Physics, 1980
- X-ray emission from laser-irradiated plane solid targetsJournal of Applied Physics, 1976