Effects of crystal orientation on the state density at the interface between anodically grown silicon dioxide and silicon
- 28 February 1974
- journal article
- other
- Published by Elsevier in Surface Science
- Vol. 41 (2) , 595-600
- https://doi.org/10.1016/0039-6028(74)90076-4
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- The electrical properties of anodically grown silicon dioxide filmsSolid-State Electronics, 1973
- Description of the SiO2Si interface properties by means of very low frequency MOS capacitance measurementsSurface Science, 1971
- Surface states at steam-grown silicon-silicon dioxide interfacesIEEE Transactions on Electron Devices, 1966