R.f. plasma-assisted chemical vapour deposition of diamond-like carbon: physical and mechanical properties
- 5 September 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 217 (1-2) , 56-61
- https://doi.org/10.1016/0040-6090(92)90605-b
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Mechanical properties and coordinations of amorphous carbonsPhysical Review Letters, 1992
- The hardness and Young’s modulus of amorphous hydrogenated carbon and silicon films measured with an ultralow load indenterJournal of Applied Physics, 1989
- The study of mechanical properties of a-C:H films by Brillouin scattering and ultralow load indentationJournal of Applied Physics, 1989
- The deposition and study of hard carbon filmsJournal of Applied Physics, 1989
- Structure and physical properties of plasma-grown amorphous hydrogenated carbon filmsThin Solid Films, 1987
- Intrinsic stress in diamond-like carbon films and its dependence on deposition parametersThin Solid Films, 1987
- Hydrogen Content in a-SiC:H Films Prepared by Plasma Decomposition of Silane and Methane or EthyleneJapanese Journal of Applied Physics, 1984
- Bonding in hydrogenated hard carbon studied by optical spectroscopySolid State Communications, 1983
- rf-plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applicationsJournal of Applied Physics, 1983
- Infrared and Raman spectra of the silicon-hydrogen bonds in amorphous silicon prepared by glow discharge and sputteringPhysical Review B, 1977