Reactive Ion Etching of GaN Thin Films
- 1 January 1993
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Reactive ion etching of gallium nitride in silicon tetrachloride plasmasa)Applied Physics Letters, 1993
- Growth of GaN by ECR-assisted MBEPhysica B: Condensed Matter, 1993
- Dry etching of thin-film InN, AlN and GaNSemiconductor Science and Technology, 1993
- Electrolytic Etching of GaNJournal of the Electrochemical Society, 1972