Hetero-Epitaxial Growth of Boron Monophosphide on Silicon Substrate Using B₂H₆-PH₃-H₂System

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1 March 1974

journal article
Published by IOP Publishing in Japanese Journal of Applied Physics

Vol. 13 (3) , 411-416
https://doi.org/10.1143/jjap.13.411

Abstract

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