Analysis of the electron traps at the 4H-SiC/SiO2 interface using combined CV/thermally stimulated current measurements
- 30 April 2004
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 72 (1-4) , 213-217
- https://doi.org/10.1016/j.mee.2003.12.039
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Significantly improved performance of MOSFETs on silicon carbide using the 15R-SiC polytypeIEEE Electron Device Letters, 1999
- Intrinsic SiC/SiO2 Interface StatesPhysica Status Solidi (a), 1997