Nanosieves with microsystem technology for microfiltration applications
- 1 December 1998
- journal article
- Published by IOP Publishing in Nanotechnology
- Vol. 9 (4) , 343-345
- https://doi.org/10.1088/0957-4484/9/4/007
Abstract
A nanosieve with a very uniform pore size of 260 nm and a pore-to-pore spacing of 510 nm has been fabricated using multiple exposure interference lithography and (silicon) micromachining technology. The nanosieve filter consists of a thick silicon nitride membrane perforated with submicron diameter pores and a macroperforated inorganic silicon support. The calculated clean water flux is at least one to two orders higher than that of conventional inorganic membranes.Keywords
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