Abstract
The optical properties of a series of In then Ag sequentially implanted silica samples are examined as a function of the relative concentrations of implanted In and Ag. The doses used were in ratios, In to Ag, of 9:3, 6:6, and 3:9. Energy of implantation was 320 keV for the In and 305 keV for the Ag. Nominal total doses as determined by current integration for the three samples were 12×1016 (In+Ag) ions/cm2. The depth profile of the implanted ions and optical absorption were found to be a function of the relative doses and to differ significantly from samples implanted separately with either In or Ag.