Identification and removal of opaque defects on X-ray masks in a focussed ion beam repair system
- 31 December 1987
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 6 (1-4) , 617-622
- https://doi.org/10.1016/0167-9317(87)90096-7
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Influence Of Sputter Effects On The Resolution In X-Ray Mask RepairPublished by SPIE-Intl Soc Optical Eng ,1986
- Untersuchungen zur Festkörperzerstäubung bei schiefwinkligem Ionenbeschuß polykristalliner Metalloberflächen im Energiebereich um 1 keVThe European Physical Journal A, 1973