The examination of poly(5-hexene-2-one sulfone) as a positive-working photoresist

• 1 June 1977
• journal article
• research article
• Published by Wiley in Polymer Engineering & Science
• Vol. 17  (6) , 350-352
• https://doi.org/10.1002/pen.760170603

Abstract

Keywords

• HEXENE
• TREATMENT
• PHOTORESIST
• THERMAL
• READILY
• SO2
• REMOVED
• ETCHANTS
• ETCHING
• POLY