Determination of Plasma Gas Temperature during Reactive Sputter Etching

• 1 June 1978
• journal article
• Published by IOP Publishing in Japanese Journal of Applied Physics
• Vol. 17  (6) , 1157-1158
• https://doi.org/10.1143/jjap.17.1157

Abstract

Keywords

• REACTIVE SPUTTER ETCHING
• PLASMA GAS TEMPERATURE
• TEMPERATURE DURING REACTIVE