Quantitative determination of argon in sputtered films by wavelength‐dispersive electron probe microanalysis
- 1 January 1982
- journal article
- Published by Wiley in X-Ray Spectrometry
- Vol. 11 (1) , 32-34
- https://doi.org/10.1002/xrs.1300110109
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Determination of the argon content of sputtered SiO2 films by X-ray fluorescenceThin Solid Films, 1969