Plasma enhanced chemical vapor deposition: Modeling and control

• 28 June 1999
• journal article
• Published by Elsevier
• Vol. 54  (15-16) , 3305-3314
• https://doi.org/10.1016/s0009-2509(98)00458-8

Abstract

Keywords

• PLASMA PROCESSES
• AMORPHOUS SILICON DEPOSITION
• DISTRIBUTED CONTROL ACTION
• PROPORTIONAL-INTEGRAL CONTROL