Glow-discharge sheath electric fields: Negative-ion, power, and frequency effects
- 1 September 1987
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review A
- Vol. 36 (5) , 2233-2242
- https://doi.org/10.1103/physreva.36.2233
Abstract
Using Stark-mixed laser-induced fluorescence, space-time–resolved maps of sheath electric fields in discharges through and Ar are measured as a function of concentration, power density (0.14–0.41 W ), and frequency (dc to 10 MHz). Sheath oscillations are observed throughout this frequency range and are discussed qualitatively in terms of characteristic times for ion and electron transport. Double layers are observed in low-frequency discharges containing more than 5% and are attributed to a buildup in negative-ion concentration; it is argued that different ratios of negative-ion to electron density in the plasma and sheath are responsible for double-layer formation at the plasma-sheath boundary. These maps should prove useful as input for particle transport simulations in plasma-processing and light-source applications. They also provide stringent tests for self-consistent sheath theories.
Keywords
This publication has 51 references indexed in Scilit:
- Continuum modeling of argon radio frequency glow dischargesApplied Physics Letters, 1987
- A Continuum Model of DC and RF DischargesIEEE Transactions on Plasma Science, 1986
- Review of recent laboratory double layer experimentsSpace Science Reviews, 1985
- Monte-Carlo simulation of electron properties in rf parallel plate capacitively coupled dischargesJournal of Applied Physics, 1983
- A Monte Carlo analysis of an electron swarm in a nonuniform field: the cathode region of a glow discharge in heliumJournal of Physics D: Applied Physics, 1982
- Simulation of plasma-assisted etching processes by ion-beam techniquesJournal of Vacuum Science and Technology, 1982
- Ion-enhanced gas-surface chemistry: The influence of the mass of the incident ionSurface Science, 1981
- A fluid description of plasma double-layersJournal of Plasma Physics, 1980
- Properties of electric discharges sustained by a uniform source of ionizationJournal of Applied Physics, 1977
- Positive-ion bombardment of substrates in rf diode glow discharge sputteringJournal of Applied Physics, 1972