Ultrahigh vacuum low temperature stage for i n s i t u film deposition and characterization
- 1 December 1975
- journal article
- research article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 46 (12) , 1642-1645
- https://doi.org/10.1063/1.1134129
Abstract
An apparatus which combines a liquid 4He Dewar with an ultrahigh vacuum system used for LEED or AES surface analysis and ultrathin film deposition is described. A linear motion bellows seal allows the substrate for film deposition to be moved out of the radition shields, which makes ion bombardment cleaning possible. A He gas heat exchanger between the substrate holder and He reservoir provides a wide variation of temperatures. In situ measurements of superconducting transition temperatures below 2 K have been made with this apparatus.Keywords
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