Thickness dependence of the properties and thermal stability of PtSi films
- 1 December 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 253 (1-2) , 467-472
- https://doi.org/10.1016/0040-6090(94)90368-9
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Platinum silicide formation using rapid thermal processingJournal of Applied Physics, 1988
- High temperature stability of PtSi formed by reaction of metal with silicon or by cosputteringJournal of Applied Physics, 1983
- Thermal stability of thin PtSi films on silicon substratesJournal of Applied Physics, 1972
- Diffusion in Thin Film Ti–Au, Ti–Pd, and Ti–Pt CouplesJournal of Vacuum Science and Technology, 1972