Oriented nickel-titanium shape memory alloy films prepared by annealing during deposition
- 5 October 1992
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 61 (14) , 1632-1634
- https://doi.org/10.1063/1.108434
Abstract
Nickel‐titanium shape memoryalloyfilms, between 2 and 10 μm thick, were sputter deposited onto (100) silicon substrates. Filmsdeposited onto a substrate at ambient temperature were amorphous; however, several post‐deposition annealing procedures produced crystalline films exhibiting the B2‐to‐B19’phase transition that gives rise to the shape memory effect.Films that were deposited onto a heated substrate, 350–460 °C, crystallized during deposition, eliminating the need for a separate annealing step. Powder x‐ray diffraction indicated that these films were highly oriented, with the NiTi (110) B2 face parallel to the silicon substrate (100) face.Keywords
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