Plasma nitrided oxide films as a thin gate dielectric
- 1 January 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 36 (1-4) , 196-204
- https://doi.org/10.1016/0169-4332(89)90914-8
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- Low Pressure Nitrided‐Oxide as a Thin Gate Dielectric for MOSFET'sJournal of the Electrochemical Society, 1983