The adsorption of sulfur on Rh(111) and Cu/Rh(111) surfaces
- 15 February 1998
- journal article
- conference paper
- Published by AIP Publishing in The Journal of Chemical Physics
- Vol. 108 (7) , 3064-3073
- https://doi.org/10.1063/1.475697
Abstract
The reaction of with Rh(111) and Cu/Rh(111) surfaces has been investigated using synchrotron-based high-resolution photoemission, thermal desorption mass spectroscopy and ab initio self-consistent-field calculations. At 100 K, the adsorption of on Rh(111) produces multilayers of species that desorb between 300 and 400 K, leaving a film of on the sample. dissociates upon adsorption on clean Rh(111) at 300 K. An adsorption complex in which is bridge bonded to two adjacent Rh atoms (Rh–S–S–Rh) is probably the precursor state for the dissociation of the molecule. The larger the electron transfer from Rh(111) into the orbitals, the bigger the adsorption energy of the molecule and the easier the cleavage of the S–S bond. On Rh(111) at 300 K, chemisorbed S is bonded to two dissimilar adsorption sites (hollow and probably bridge) that show well separated S binding energies and different bonding interactions. Adsorption on bridge sites is observed only at S coverages above 0.5 ML, and precedes the formation of films. The bonding of S to Rh(111) induces a substantial decrease in the density of states that the metal exhibits near the Fermi level, but the electronic perturbations are not as large as those found for S/Pt(111) and S/Pd(111). Cu adatoms significantly enhance the rate of sulfidation of Rh(111) through indirect and direct interactions. In the presence of Cu there is an increase in the thermal stability of sulfur on Rh(111). The adsorption of on Cu/Rh(111) surfaces produces and species that exhibit a distinctive band structure and decompose at temperatures between 900 and 1100 K: +Cu(gas)+S/Rh(111).
Keywords
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