New large area ultraviolet lamp sources and their applications
- 1 January 1997
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 121 (1-4) , 349-356
- https://doi.org/10.1016/s0168-583x(96)00538-1
Abstract
No abstract availableKeywords
This publication has 36 references indexed in Scilit:
- Application of excimer incoherent-UV sources as a new tool in photochemistry: photodegradation of chlorinated dibenzodioxins in solution and adsorbed on aqueous pulp sludgeJournal of Photochemistry and Photobiology A: Chemistry, 1994
- Ultraviolet ozone oxidation of Si surface studied by photoemission and surface infrared spectroscopyJournal of Vacuum Science & Technology A, 1992
- Industrial applications of excimer ultraviolet sourcesMaterials & Design, 1991
- Modeling and applications of silent discharge plasmasIEEE Transactions on Plasma Science, 1991
- High‐Quality 100Å SiO2 Films Fabricated by a New ECR Microwave PECVD ProcessJournal of the Electrochemical Society, 1991
- Direct Writing of Copper Film Patterns by Laser‐Induced Decomposition of Copper AcetateJournal of the Electrochemical Society, 1988
- Ozone synthesis from oxygen in dielectric barrier dischargesJournal of Physics D: Applied Physics, 1987
- Spectral and kinetic studies of the second continuum fluorescence of xenon excited by synchrotron radiationChemical Physics Letters, 1978
- Pressure dependent decay of the ultraviolet continuum of argonPhysics Letters A, 1974
- Time-Dependent Study of Vacuum-Ultraviolet Emission in ArgonPhysical Review A, 1972