Annealing effects in silicon nitride encapsulant films
- 31 March 1985
- journal article
- Published by Elsevier in Physica B+C
- Vol. 129 (1-3) , 435-439
- https://doi.org/10.1016/0378-4363(85)90618-7
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Plasma-enhanced CVD: Oxides, nitrides, transition metals, and transition metal silicidesJournal of Vacuum Science & Technology A, 1984