Application of real time infrared spectroscopy to monitoring the kinetics of chemically amplified resists
- 1 November 1994
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 12 (6) , 3868-3873
- https://doi.org/10.1116/1.587565
Abstract
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