Nickel diffusion in vanadium
- 1 July 1986
- journal article
- research article
- Published by Taylor & Francis in Philosophical Magazine A
- Vol. 54 (1) , L21-L29
- https://doi.org/10.1080/01418618608242874
Abstract
The diffusion of 63Ni in vanadium has been measured over the temperature range 900–1675°C. Analysis of the results gives a temperature dependence of the diffusion coefficient D which can be expressed in the Arrhenius form: The behaviour is similar to that of cobalt diffusion in vanadium, but different from that of iron diffusion in vanadium and of self-diffusion in vanadium, for which non-Arrhenius behaviour is observed. The differences are attributed to a smaller concentration of divacancies in the case of Ni and Co, resulting from a strong electrostatic interaction between Ni (or Co) and a single vacancy.Keywords
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